MPAsp-E1003H

Basic Information

Model Name: MPAsp-E1003H

Features

MPAsp-E1003H boasts enhanced yield thanks to the widest^*1 exposure on the Generation 6 glass plate. Equipped with an optical system whose performance has been proven in existing 8th generation substrate system MPAsp-H1003H (released in July 2022), which is capable of batch exposing 65” panels for such products as large-sized TVs, the new product's single exposure width at a high resolution of 1.5 μm (L/S^*2) has increased by approximately 1.2 times^*3. Smartphone displays, for example, which require six exposure shots per glass plate with the previous system, can be exposed with four shots, which helps to improve productivity. Additionally, even extra-wide large displays specifically made for vehicles can now be produced in two shots without any stitching to achieve efficient mass production.

The new product also boasts high overlay accuracy. It deploys the same alignment system as the MPAsp-E813H 6th generation substrate system (released in September 2014), and is equipped with a newly developed non-linear correction REI (Real-Time Equalizing distorted Image)unit. Even with expanded exposure width, the new product realizes a high level of overlay accuracy thanks to the REI unit.

Another feature of the new system is its high flexibility. In order to be adaptable to diverse manufacturing processes while securing high quality production, the system inherits several proven mechanisms from MPAsp-H1003H including the illumination mode switching function that enables ultra-high resolution, slit illuminance control (SIC) technology that maintains consistent exposure linewidth, and a universal chuck that makes it possible to select the vertical or horizontal orientation of the glass plate best suited to the exposure layout.

• *1 Among Canon-made FPD lithography equipment compatible with Generation 6 glass panels
• *2 Line and Space. Refers to patterns in which lines and spaces are separated by consistent intervals
• *3 In comparison to MPAsp-E813H