Semiconductor Lithography Equipment
KrF Stepper for IoT devices
Model Name: FPA-3030EX6
FPA-3030EX6 steppers are compatible with a variety of special substrates & small-sized substrates
Equipped with the same Wafer Feeding System as the proven FPA-3030i5+ i-line stepper, the FPA-3030EX6 supports the handling of substrates of various materials, sizes and thicknesses used for manufacturing IoT & power devices.
The FPA-3030EX6 offers the highest level of performance among KrF excimer laser steppers
The performance of previous model FPA-3000EX6 steppers was inherited, and the highest-level of resolution (150 nm), overlay accuracy (25 nm) and productivity (throughput *121 wph) were achieved among KrF excimer laser steppers in the same class.
- * 200 mm (8 inch) wafer, 60 shots
FPA-3030EX6 steppers are compatible with FPA-3000EX6 reticle and recipes
Compatibility with FPA-3000EX6 reticles and recipes allows effective use of existing facilities and assets.
|Resolution||≦ 150 nm|
|NA (Numerical Aperture)||0.65～0.50 (Variable)|
|Field Size||22 mm x 22 mm|
|Exposure Wavelength||KrF 248 nm|
|Reticle Size||6 inch|
|Wafer Size||100 mm (4 inch), 125 mm (5 inch), 150 mm (6 inch), 200 mm (8 inch) (Selection)|
|Overlay Accuracy||≦ 25 nm|
|Major Options||Wafer Handling Kit for Special Substrates
PC Remote Console
GEM-compliant online software
Pellicle Particle Checker