Semiconductor Lithography Equipment
News
- September 24, 2024
- Canon releases FPA-3030i6 semiconductor lithography system for small wafers, with a newly developed lens and a variety of options to meet the growing demand for power devices
- October 13, 2023
- Nanoimprint lithography semiconductor manufacturing system that covers diverse applications with simple patterning mechanism
- March 13, 2023
- Canon introduces a new lithography system with large exposure field at a high resolution for producing full-frame CMOS sensors, XR devices and others
- February 21, 2023
- New Canon wafer measurement equipment improves productivity of lithography systems, enabling high-precision alignment for increasingly complex semiconductor manufacturing processes
- December 6, 2022
- New Canon option for semiconductor lithography system back-end process contributes to 3D advanced packaging technologies, enables mass production of dense circuitry with exposure fields of up to 100 mm x 100 mm
- October 6, 2022
- Canon Utsunomiya Office to install new manufacturing facilities, strengthen manufacturing capacity for semiconductor lithography systems
- September 5, 2022
- Canon announces "Lithography Plus" solution platform offering Canon's support know-how to help maximize productivity for semiconductor lithography systems
- June 13, 2022
- Canon commences sales of a new 'Grade 10' productivity upgrade option for FPA-6300ES6a KrF scanners that realizes industry-leading high-productivity standard of 300 WPH
- January 24, 2022
- Canon honored with TSMC 2021 Excellent Performance Award to Outstanding Suppliers
- February 2, 2021
- Canon commences sales of the FPA-5520iV LF Option for back-end process semiconductor lithography systems that realizes a wide exposure field, supporting larger advanced packaging
- October 27, 2020
- Canon commences sales of FPA-3030i5a Semiconductor Lithography System supporting reduced cost of ownership manufacturing for small substrates
- June 23, 2020
- Canon commences sales of the FPA-8000iW semiconductor lithography system which combines a 1 µm resolution with support for large panels
- January 15, 2020
- Canon celebrates the 50th anniversary of the PPC-1, Japan's first semiconductor lithography system